AFM and SEM study on the morphology of SiO<sub>2</sub> nanoparticles in polishing slurries

Authors

  • Ya. A. Kosenok Francisk Skorina Gomel State University
  • V. E. Gaishun Francisk Skorina Gomel State University
  • O. I. Tyulenkova Francisk Skorina Gomel State University
  • V. G. Denisman Francisk Skorina Gomel State University
  • T. A. Gerasimenya Francisk Skorina Gomel State University
  • O. A. Matyushonok Francisk Skorina Gomel State University

Keywords:

polishing slurry, silica nanoparticles, AFM study, SEM study, silica sol

Abstract

A method is described of obtaining and investigation of the morphology of nanoparticles in concentrated aqueous slurries based on pyrogenic silica and silica sol obtained by the ion exchange technology. These results are useful for development of polishing compositions and also to establish the formation regularities of structural, chemical and electrical properties of the surface as well as for the explanation of the mechanism of chemical-mechanical polishing of semiconductor materials.

References

1. Юзова В.А., Шелованова Г.Н. Актуальные проблемы современной электроники и наноэлектроники: курс лекций. – Красноярск: ИПК СФУ, 2009. – 220 с.

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How to Cite

(1)
Kosenok, Y. A.; Gaishun, V. E.; Tyulenkova, O. I.; Denisman, V. G.; Gerasimenya, T. A.; Matyushonok, O. A. AFM and SEM Study on the Morphology of SiO<sub>2< sub> Nanoparticles in Polishing Slurries. Him. Fiz. Tehnol. Poverhni 2014, 5, 89-93.

Issue

Vol. 5 No. 1 (2014): Chemistry, Physics and Technology of Surface / Himia, Fizika ta Tehnologia Poverhni

Section

Articles

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